抽象的

Effect of annealing temperature on structure properties of SnS thin films

Alia A.A.Shehab, Najiba A.AL-Hamadni, Duha M.A.Latif

SnS thin films of thickness, (300 nm± 0.01) deposited by thermal evaporation with rate deposition (48 nm/s) on suitably cleaned glass substrates at room temperature substrate and then the films were annealed at 200°C temperature in vacuumfor (2 h). The structural properties of the films are determined using x-ray diffraction, scanning electron microscopy (SEM) and atomic force microscopy (AFM). X-ray diffraction patterns indicated that the films are poly crystalline for an orthorhombic structure,with (111) preffered orientation. The values of lattice constants, grain size,microstrain and dislocation density of the deposited films were calculated and their variations with annealing. The scanning electron microscopy (SEM) and atomic forcemicroscopy (AFM) studies reveal good surfacemorphology, the average grain size and surface roughness were found to increase with annealing.