抽象的

Materials Technology 2019: Fabrication of graphene-based materials using microwave-exited atmospheric pressure plasma- Mineo Hiramatsu, Meijo University, Japan

Mineo Hiramatsu


 Graphene-based materials such as carbon nanotube (CNT) and graphene itself have attracted much attention due to their emerging applications. Graphene based materials can be synthesized by several plasma enhanced chemical vapor deposition (PECVD) techniques on heated substrates. For example, plane graphene can be formed by low-pressure PECVD on Cu and Ni in the remote plasma configuration. However, excess flux of carbon precursors causes supersaturation and ion bombardment induces the defects. Previously a microwave-excited non-epuilibrium atmospheric pressure plasma source with high electron density of ~1015 cm-3 and low electron temperature of ~1 eV was applied to the synthesis of CNTs. This type of plasma has a great potential for realizing the new material processing because the larger amount of radicals is estimated by a few orders of magnitude compared with the conventional low-pressure and high-density plasmas. Furthermore, the effect of ion bombardment on the growing surface can be removed due to the high-pressure operation. Here, microwave-excited atmospheric pressure plasma employing He/H2/CH4 mixture was applied to the synthesis of graphene-based materials. A schematic of atmospheric pressure PECVD system is shown in Fig. 1. The microwave (2.45 GHz) propagates from the top of the deposition chamber to the micro-slit electrode. The micro-slit electrode width is 0.2 mm. Formation of plane graphene was carried out on Cu substrate for 10- 300 sec at microwave power of 100 W, total pressure of 1 atm and substrate temperature of about 700 ËÂ?C. In spite of the localized plasma shape, graphene was formed uniformly on the whole substrate. Moreover, the number of graphene layers did not increase even in the increase of formation period. Results indicated that the self-limiting growth of few-layer graphene could be attained on the Cu substrate by the supply of long-lived hydrocarbon radicals without ion bombardment using atmospheric pressure plasma.

 


免责声明: 此摘要通过人工智能工具翻译,尚未经过审核或验证

索引于

  • 中国社会科学院
  • 谷歌学术
  • 打开 J 门
  • 中国知网(CNKI)
  • 引用因子
  • 宇宙IF
  • 电子期刊图书馆
  • 研究期刊索引目录 (DRJI)
  • 秘密搜索引擎实验室
  • ICMJE

查看更多

期刊国际标准号

期刊 h 指数

Flyer