抽象的

Photoreactivity Of Epoxy Resins

Cheng-Siang Lee, Shiliang Fan, Zoubida Seghier, Freddy Y.C.Boey, Marc J.M.Abadie


Work had been done to establish the photoreactivity of epoxy resins with respect to the chemical structure of their monomers. Two epoxymonomers had been choosen, both having two epoxy functional groups at each terminal ends. The difference between these two epoxy monomers being the length separating the two functional groups called the “space” group. Results show that the photochemical reactivity is influenced by the chemical structures of monomers, and thus their physical-chemical properties.


索引于

  • 中国社会科学院
  • 谷歌学术
  • 打开 J 门
  • 中国知网(CNKI)
  • 引用因子
  • 宇宙IF
  • 米亚尔
  • 秘密搜索引擎实验室
  • 欧洲酒吧
  • 巴塞罗那大学
  • ICMJE

查看更多

期刊国际标准号

期刊 h 指数

Flyer